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- Morihisa Hoga
Morihisa Hoga
Biography
1974: B.E., Department of Physics, Faculty of Science and Engineering, Waseda University
1974: Joined Hitachi, Ltd.
2000: Joined Dai Nippon Printing Co., Ltd.
2016: Retired from Dai Nippon Printing Co., Ltd.
2018: Invited senior researcher at CPSEC, AIST
2023: Technical person in charge of artifact metric at CPSEC, AIST
Papers（Selective）
- M. Hoga, K. Itoh, N. Kuwahara, M. Fukuda, N. Toyama, S. Kurokawa, and T. Doi; “Comparison of quartz and silicon as a master mold substrate for patterned media UV-NIL replica process” Microelectronic Engineering, Vol.88, Issue 8, p1975~1977 (2011)
- M. Hoga, M. Ishikawa, N. Kuwahara, T. Takikawa, and S. Sasaki; “Development of Nanoimprint Mold Using JBX-9300FS” Jeol News Vol.44, No1, p46～51 (2009)
- T. Matsumoto, N. Yoshida, S. Nishio, M. Hoga, Y. Ohyagi, N. Tate, and M. Naruse, “Optical nano artifact metrics using silicon random nanostructures”, Sci. Rep. 6, 32438 (2016)
- M. Naruse, M. Hoga, Y. Ohyagi, S. Nishio, N. Tate, N. Yoshida, and T. Matsumoto, “Eigenanalysis of morphological diversity in silicon random nanostructures formed via resist collapse”, Physica A, 462, p883-888 (2016)
Books
- I. Tanabe, Y. Takehana, M. Hoga; “Photomask Technology” Tokyo Denki University Press (2011)
- I. Tanabe, Y. Takehana, M. Hoga; “Introduction to Photomask Technology” Kogyo Chosakai Publishing (2006)
- I. Tanabe, Y. Takehana, M. Hoga; “Overview of Photomask Technology” Kogyo Chosakai Publishing (1996)
Awards
- 2016: JRSC Honor Award, SEMI
- 2015: Research Encouragement Award, Japan Printing Society
- 2012: The 26th Grand Prize for Frontier Technology: Pave a New Way for Creativity, Fuji Sankei Business i
- 2000: Best Poster Paper Award, SPIE/BACUS Symposium